Low-voltage high-speed programming gate-all-around floating gate memory cell with tunnel barrier engineering
The aim of this study is to investigate the memory performances of gate-all-around floating gate (GAA-FG) memory cell implementing engineered tunnel barrier concept of variable oxide thickness (VARIOT) of low-k/high-k for several high-k (i.e., Si3N4, Al2O3, HfO2, and ZrO2) with low-k SiO2 using thre...
Saved in:
Main Authors: | Hamzah, Afiq, Alias, N. Ezaila, Ismail, Razali |
---|---|
Format: | Article |
Published: |
Japan Society of Applied Physics
2018
|
Subjects: | |
Online Access: | http://eprints.utm.my/id/eprint/84855/ http://dx.doi.org/10.7567/JJAP.57.06KC02 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Gate-all-around floating gate (gaa-fg) with variable oxide thickness for nonvolatile memory
by: Alias, Nurul Ezaila, et al.
Published: (2018) -
Effect of low-k oxide thickness variation on gate-all-around floating gate with optimized SiO2/La2O3 tunnel barrier
by: A. Hamid, Farah, et al.
Published: (2019) -
Graphene as charge storage layer in floating gate flash memory with high-k tunnel barrier engineering
by: Alias, Nurul Ezaila, et al.
Published: (2018) -
Graphene as charge storage layer in floating gate flash memory with high-k tunnel barrier engineering
by: Alias, Nurul Ezaila, et al.
Published: (2018) -
Charge-based compact model of gate-all-around floating gate nanowire with variable oxide thickness for flash memory cell
by: Hamzah, Muhammad Afiq Nurudin
Published: (2018)