Explicit charge-based model for strained-silicon gate-all-around mosfet including quantum and short channel effects
In the recent development of advanced nanoelectronic devices, strain application on silicon Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) has been identified as a key factor towards the improvement of device performance. Strainedsilicon is preferred due to less impact of the short chann...
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Format: | Thesis |
Language: | English |
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2020
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Online Access: | http://eprints.utm.my/id/eprint/99521/1/FatimahKhairiahAbdPSKE2020.pdf.pdf http://eprints.utm.my/id/eprint/99521/ http://dms.library.utm.my:8080/vital/access/manager/Repository/vital:144977 |
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