The Growth Of Highly Doped p-GaN On Sapphire By RF Plasma-Assisted Molecular Beam Epitaxy.
In this paper, we present the study of the electrical, structural and optical properties of p-type GaN grown on sapphire by RF plasma-assisted molecular beam epitaxy (RF-MBE).
Saved in:
Main Authors: | C, W Chin, Hassan, Z., F, K Yam |
---|---|
Format: | Conference or Workshop Item |
Language: | English |
Published: |
2007
|
Subjects: | |
Online Access: | http://eprints.usm.my/14827/1/paper4.pdf http://eprints.usm.my/14827/ |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Optical Characterization Of GaN Thin Film Grown On Si(111) By Radio-Frequency Plasma-Assisted Molecular Beam Epitaxy.
by: L, S Chuah, et al.
Published: (2007) -
GaN nucleation on patterned sapphire substrate with different shapes for improved GaN overgrowth
by: Md. Taib, M. Ikram, et al.
Published: (2022) -
Growth of semi-polar (11-22) GaN epitaxial layer on M-plane sapphire via MOCVD / Mohd Afiq Anuar
by: Mohd Afiq , Anuar
Published: (2020) -
Optimization of AlN/GaN strained-layer superlattice for GaN epitaxy on Si(111) substrate / Yusnizam Yusuf
by: Yusnizam, Yusuf
Published: (2017) -
Characterization of AlInN layer grown on GaN/Sapphire substrate by MOCVD
by: Wei-Ching Huang,, et al.
Published: (2013)