Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire
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| Main Authors: | , , |
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| Other Authors: | |
| Format: | Working Paper |
| Language: | English |
| Published: |
Institute of Electrical and Electronics Engineers (IEEE)
2013
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| Subjects: | |
| Online Access: | http://dspace.unimap.edu.my/xmlui/handle/123456789/22907 |
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