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Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire

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Main Authors: Tijjani Adam, Shuwa, Uda, Hashim, Prof. Dr., Leow, Pei Ling
Other Authors: tijjaniadam@yahoo.com
Format: Working Paper
Language:English
Published: Institute of Electrical and Electronics Engineers (IEEE) 2013
Subjects:
Alignment
Critical dimension
Fabrication
Nanowire
Pattern transfer
Precision
Repeatability and reliability
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/22907
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spelling my.unimap-229072014-04-08T09:00:34Z Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire Tijjani Adam, Shuwa Uda, Hashim, Prof. Dr. Leow, Pei Ling tijjaniadam@yahoo.com uda@unimap.edu.my Alignment Critical dimension Fabrication Nanowire Pattern transfer Precision Repeatability and reliability Link to publisher's homepage at http://ieeexplore.ieee.org/ In fabrication of Nanowire alignment and exposure are the most critical steps in photolithography process, the resolution requirements and precise alignment are vital, each mask needs to be precisely aligned with original alignment mark. Otherwise, it can't successfully transfer the original pattern to the wafer surface causing device and circuit failure. Precise transfer of pattern transfer means guarantee in high repeatability and reliability, high throughput and low cost of ownership. By improving this resolution and alignment precision the minimum size can be further reduced to 1nm and beyond. The other important aspect of achieving minimum precised size is, the photo resist must be very sensitive to the exposure light to achieve reasonable throughput. However, if the sensitivity is too high, other photoresist characteristics can be affected, including the resolution. Thus, the paper present a preliminary study on fundamentals of resist exposure and development mechanisms for fabrication of Nanowire, We demonstrated significance of considering process parameters such as quality of resist, soft bake, exposure time and intensity, and development time. 2013-01-09T00:52:21Z 2013-01-09T00:52:21Z 2012 Working Paper p. 1-4 978-145770798-8 http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=6149644 http://hdl.handle.net/123456789/22907 en Proceedings of the International Conference on Enabling Science and Nanotechnology (ESciNano) 2012 Institute of Electrical and Electronics Engineers (IEEE)
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Alignment
Critical dimension
Fabrication
Nanowire
Pattern transfer
Precision
Repeatability and reliability
spellingShingle Alignment
Critical dimension
Fabrication
Nanowire
Pattern transfer
Precision
Repeatability and reliability
Tijjani Adam, Shuwa
Uda, Hashim, Prof. Dr.
Leow, Pei Ling
Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire
description Link to publisher's homepage at http://ieeexplore.ieee.org/
author2 tijjaniadam@yahoo.com
author_facet tijjaniadam@yahoo.com
Tijjani Adam, Shuwa
Uda, Hashim, Prof. Dr.
Leow, Pei Ling
format Working Paper
author Tijjani Adam, Shuwa
Uda, Hashim, Prof. Dr.
Leow, Pei Ling
author_sort Tijjani Adam, Shuwa
title Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire
title_short Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire
title_full Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire
title_fullStr Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire
title_full_unstemmed Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire
title_sort mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire
publisher Institute of Electrical and Electronics Engineers (IEEE)
publishDate 2013
url http://dspace.unimap.edu.my/xmlui/handle/123456789/22907
_version_ 1643793832992571392
score 13.214268

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