Holdings: Effect of alignment mark architecture on alignment signal behavior in advanced lithography

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Bibliographic Details
Main Authors:	Normah, Ahmad, Uda, Hashim, Mohd Jeffery, Manaf, Kader Ibrahim, Abdul Wahab
Format:	Article
Language:	English
Published:	Universiti Malaya 2009
Subjects:	Alignment mark Alignment signal Lithography Lithography > Technique Metal mark Deposition
Online Access:	http://dspace.unimap.edu.my/xmlui/handle/123456789/6836
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