Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire

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Bibliographic Details
Main Authors: Tijjani Adam, Shuwa, Uda, Hashim, Prof. Dr., Leow, Pei Ling
Other Authors: tijjaniadam@yahoo.com
Format: Working Paper
Language:English
Published: Institute of Electrical and Electronics Engineers (IEEE) 2013
Subjects:
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/22907
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