Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire

• Main Authors: Tijjani Adam, Shuwa, Uda, Hashim, Prof. Dr., Leow, Pei Ling
• Other Authors: [e-mail]
• Format: Working Paper
• Language: English
• Published: Institute of Electrical and Electronics Engineers (IEEE) 2013
• Subjects: Alignment; Critical dimension; Fabrication; Nanowire; Pattern transfer; Precision; Repeatability and reliability
• Online Access: http://dspace.unimap.edu.my/xmlui/handle/123456789/22907

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