Influence of Annealing Temperature on InN Thin Films Grown by RF Magnetron Sputtering
This paper presents the study and characterization of indium nitride (InN) films grown on quartz glass and p-Si (111) substrates by RF magnetron sputtering method using pure indium target in argon (Ar) and nitrogen (N 2) environment. The characterization was carried out by high resolution X-ray di...
Saved in:
Main Authors: | Bashir, Umar, Hassan, Zainuriah, Ahmed, Naser M. |
---|---|
Format: | Conference or Workshop Item |
Language: | English |
Published: |
2016
|
Subjects: | |
Online Access: | http://eprints.usm.my/48795/1/ZO3.pdf%20done.pdf http://eprints.usm.my/48795/ |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Effects Of Post-Deposition Annealing In Oxygen Ambient Of Rf Magnetron Sputtered Ga2O3 Thin Film
by: Hedei, Puteri Haslinda Megat Abdul, et al.
Published: (2020) -
Effects Of Post-Deposition Annealing In Oxygen Ambient Of Rf Magnetron Sputtered Ga2O3 Thin Film
by: Hedei, Puteri Haslinda Megat Abdul, et al.
Published: (2020) -
Characterizations of InN Thin Films Grown on Si (110) Substrate by Reactive Sputtering
by: Amirhoseiny, M., et al.
Published: (2011) -
Effect Of Annealing Temperature On Cerium Oxide Thin Films Grown By Dc Sputtering Method
by: Zabidi, Ainita Rozati Mohd, et al.
Published: (2020) -
Effect Of Annealing Temperature On Cerium Oxide Thin Films Grown By DC Sputtering Method
by: Ainita Rozati Mohd, Zabidi, et al.
Published: (2020)