Influence of substrate annealing on inducing Ti3+ and oxygen vacancy in TiO2 thin films deposited via RF magnetron sputtering

• Main Authors: Abdullah, S.A., Sahdan, M.Z., Nafarizal, N., Saim, H., Embong, Z., Cik Rohaida, C.H., Adriyanto, F.
• Format: Article
• Language: English
• Published: ScienceDirect 2018
• Subjects: TA401-492 Materials of engineering and construction. Mechanics of materials
• Online Access: http://eprints.uthm.edu.my/3360/1/AJ%202018%20%284%29.pdf; http://eprints.uthm.edu.my/3360/; https://doi.org/10.1016/j.apsusc.2018.08.137

Nano-crystalline TiO2 has been prepared by RF magnetron sputtering at varied substrate temperatures ranging from 200 to 500 °C. The alteration of oxygen and titanium atom in TiO2 at uppermost surface is clearly observed on the effect of annealing temperature by Auger Electron Spectroscopy (AES) tech...