Optimisation of N-channel trench power MOSFET using 2 k factorial design method
The main objective of this research is to optimize the trench depth, trench width, epitaxial resistivity and epitaxial thickness in trench power MOSFET so as to obtain high breakdown voltage but low on-resistance. Optimisation of these parameters are based on 2 k factorial design method for achievin...
Saved in:
Main Authors: | Nur, S.I., Ibrahim, A., Hafizah, H. |
---|---|
格式: | |
出版: |
2017
|
在线阅读: | http://dspace.uniten.edu.my:8080/jspui/handle/123456789/5257 |
标签: |
添加标签
没有标签, 成为第一个标记此记录!
|
相似书籍
-
Optimisation of N-channel trench power MOSFET using 2 k factorial design method
由: Nur S.I., et al.
出版: (2023) -
Optimization of N-Channel trench power MOSFET using 2k factorial design method
由: Nur Syakimah Ismail,, et al.
出版: (2009) -
EFFECTS OF CHANNEL LENGTH VARIATION ON TRANSCONDUCTANCE N-CHANNEL MOSFET
由: BAKHTIAR JAMILI, MUHAMAD AZWAN BIN
出版: (2012) -
Characterization of planar and vertical n-channel mosfet in nanometer regime
由: Sulaiman, Ima
出版: (2007) -
Optimization of 3-D N-channel twin silicon nanowire MOSFET
由: Alias, Nurul Ezaila, et al.
出版: (2015)