Multi beam laser grooving process parameter development and die strength characterization for 40nm node low-K/ULK wafer
Ablation; Cost effectiveness; Dies; Industrial electronics; Ion beams; Laser ablation; Neodymium alloys; Neodymium lasers; Scanning electron microscopy; Semiconductor lasers; Silicon wafers; Yttrium aluminum garnet; Inspection tools; Laser frequency; Laser micro-machining; Laser process parameters;...
Saved in:
Main Authors: | Shi K.W., Yow K.Y., Lo C., Kar Y.B., Misran H. |
---|---|
Other Authors: | 35796107300 |
Format: | Conference Paper |
Published: |
Institute of Electrical and Electronics Engineers Inc.
2023
|
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Single & multi beam laser grooving process parameter development and die strength characterization for 40nm node low-K/ULK wafer
by: Shi K.W., et al.
Published: (2023) -
Ultraviolet Laser Diode Ablation Process for CMOS 45 nm Copper Low-K Semiconductor Wafer
by: Shi K.W., et al.
Published: (2023) -
Ulke raporu Malezya
by: Mokhtar, Khairil Azmin, et al.
Published: (2013) -
Küresel ülke Türkiye (Global Power Turkey)
by: Kayadibi, Saim
Published: (2011) -
Hatırlanamayan ülke Myanmar (Unremembered country Myanmar)
by: Kayadibi, Saim
Published: (2012)