Thermal oxidation improvement in semiconductor wafer fabrication

• Main Authors: Mahandran, C. J., Fatah, A. Y. A., Bani, N. A., Kaidi, H. M., Muhtazaruddin, M. N,., Amran, N. B.
• Format: Article
• Published: Institute of Advanced Engineering and Science 2019
• Subjects: T Technology (General)
• Online Access: http://eprints.utm.my/id/eprint/88916/; http://www.dx.doi.org/10.11591/ijpeds.v10.i3.1141-1147

Thermal oxidation is a process done to grow a layer of oxide on the surface of a silicon wafer at elevated temperatures to form silicon dioxide. Usually, it en-counters instability in oxide growth and results in variation in the oxide thickness formed. This leads to downtime of furnace and wafer scr...