Influence of oxygen on structural and optoelectronic properties of CdS thin film deposited by magnetron sputtering technique
In this study, CdS thin films with thicknesses of approximately 100 nm were deposited at a substrate temperature of 100 �C by a sputtering technique under two different ambient conditions�pure Ar ambient and Ar/O2 (99:1) ambient�at deposition power densities of 1.0 and 2.0 W/cm2, respectively The fi...
Saved in:
Main Authors: | Islam M.A., Hatta S.F.W.M., Misran H., Akhtaruzzaman M., Amin N. |
---|---|
Other Authors: | 57220973693 |
Format: | Article |
Published: |
Physical Society of the Republic of China
2023
|
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Structural properties of CdS thin-films deposited by RF magnetron sputtering
by: Ahamed E.M.K.I., et al.
Published: (2023) -
Optical Characterization of Sputter Deposited CdS Thin Films and Measurement of Deposition Rate
by: Ahamed E.M.K.I., et al.
Published: (2023) -
CdS film thickness characterization by R.F. magnetron sputtering
by: Uda, Hashim, Prof. Dr., et al.
Published: (2010) -
A comparative study of CdS thin films grown on ultra-thin glass substrates by RF magnetron sputtering and chemical bath deposition
by: Doroody C., et al.
Published: (2023) -
Deposition of CdS Thin Film by Thermal Evaporation
by: Dey, M., et al.
Published: (2020)