Morphology, Topography and Thickness of Copper Oxide Thin Films Deposited using Magnetron Sputtering Technique

• Main Authors: Jia, Wei Low, Nafarizal, Nayan, Mohd Zainizan, Sahdan, Mohd Khairul, Ahmad, Ali Yeon, Md Shakaff, Ammar, Zakaria, Ahmad Faizal, Mohd Zain
• Format: Conference or Workshop Item
• Language: English
• Published: 2013
• Subjects: TS Manufactures; TP Chemical technology
• Online Access: http://umpir.ump.edu.my/id/eprint/6238/1/Morphology%2C_Topography_and_Thickness_of_Copper.pdf; http://umpir.ump.edu.my/id/eprint/6238/; http://dx.doi.org/10.1109/RSM.2013.6706548

Cupric Oxide (CuO) is one of the p-type metal oxide semiconductors that are suitable for use in gas sensing device. The copper oxide thin film was prepared on silicon wafer by sputtering of pure copper target at difference deposition time of 5 min, 10 min and 15 min using RF magnetron sputtering tec...