صورة الغلاف

Nanowire formation for single electron transistor using SEM based Electron Beam Lithography (EBL) technique: Positive tone vs negative tone e-beam resist

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محفوظ في:

التفاصيل البيبلوغرافية
المؤلفون الرئيسيون:	Mohammad Nuzaihan, Md Nor, Uda, Hashim, Nur Hamidah, Abdul Halim, Bajuri, S. N M
التنسيق:	مقال
اللغة:	English
منشور في:	Nano Science and Technology Institute 2009
الموضوعات:	Electron beam lithography ma-N 2405 resist Nanowires PMMA Scanning electron microscope Nanotechnology Nanowires > Design and construction Nanostructured materials
الوصول للمادة أونلاين:	http://dspace.unimap.edu.my/xmlui/handle/123456789/6977
الوسوم:	إضافة وسم لا توجد وسوم, كن أول من يضع وسما على هذه التسجيلة!

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