Nanowire formation for single electron transistor using SEM based Electron Beam Lithography (EBL) technique: Positive tone vs negative tone e-beam resist

• Main Authors: Mohammad Nuzaihan, Md Nor, Uda, Hashim, Nur Hamidah, Abdul Halim, Bajuri, S. N M
• Format: Article
• Language: English
• Published: Nano Science and Technology Institute 2009
• Subjects: Electron beam lithography; ma-N 2405 resist; Nanowires; PMMA; Scanning electron microscope; Nanotechnology; Nanowires > Design and construction; Nanostructured materials
• Online Access: http://dspace.unimap.edu.my/xmlui/handle/123456789/6977

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