Holdings: Optimization of 950K PMMA resists for Nano-application using Statistical Design Expert

Access is limited to UniMAP community.

Saved in:

Bibliographic Details
Main Author:	Khoo Chien Chin
Other Authors:	Uda Hashim, P.M. Dr. (Advisor)
Format:	Learning Object
Language:	English
Published:	Universiti Malaysia Perlis 2008
Subjects:	Lithography, Electron beam Lithography Polymethyl-methacrylate (PMMA Lithography > Technique Integrated circuits Nanotechnology
Online Access:	http://dspace.unimap.edu.my/xmlui/handle/123456789/2390
Tags:	Add Tag No Tags, Be the first to tag this record!