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Optimization of 950K PMMA resists for Nano-application using Statistical Design Expert

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书目详细资料
主要作者:	Khoo Chien Chin
其他作者:	Uda Hashim, P.M. Dr. (Advisor)
格式:	Learning Object
语言:	English
出版:	Universiti Malaysia Perlis 2008
主题:	Lithography, Electron beam Lithography Polymethyl-methacrylate (PMMA Lithography > Technique Integrated circuits Nanotechnology
在线阅读:	http://dspace.unimap.edu.my/xmlui/handle/123456789/2390
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