The Effect of Process Parameters on Metal Step Coverage for Aluminum by Evaporation Technique

• Main Author: Noraishah Azman
• Other Authors: Ramzan Mat Ayub (Advisor)
• Format: Learning Object
• Language: English
• Published: Universiti Malaysia Perlis 2008
• Subjects: Very Large Scale Integration (VLSI); Electron Beam Lithography (EBL); Aluminium alloys; Metal oxide semiconductors, Complementary; Evaporation; Semiconductor devices; Integrated circuits
• Online Access: http://dspace.unimap.edu.my/xmlui/handle/123456789/1356

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