Cover Image

Mask Making Process (Positive and Negative Mask)

PECIPTA 2007 dianjurkan oleh Kementerian Pengajian Tinggi Malaysia (KPTM) dengan kerjasama Universiti Sains Malaysia (USM) pada 10 - 12 Ogos 2007 di Pusat Konvensyen Kuala Lumpur (KLCC), Kuala Lumpur.

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Bibliographic Details
Main Authors: Uda, Hashim, Prof. Dr., Nur Hamidah, Abdul Halim, Mohamad Nuzaihan, Md Nor, Zul Azhar, Zahid Jamal, Prof. Dr.
Other Authors: uda@unimap.edu.my
Format: Image
Language:English
Published: Kementerian Pengajian Tinggi Malaysia (KPTM) 2010
Subjects:
Mask
E-beam lithography (EBL)
EBL System
UniMAP > Research and development
UniMAP > Exhibition
PECIPTA 2007
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/8172
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http://dspace.unimap.edu.my/xmlui/handle/123456789/8172

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