Comments: Optimization of 950K PMMA resists for Nano-application using Statistical Design Expert

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Bibliographic Details
Main Author:	Khoo Chien Chin
Other Authors:	Uda Hashim, P.M. Dr. (Advisor)
Format:	Learning Object
Language:	English
Published:	Universiti Malaysia Perlis 2008
Subjects:	Lithography, Electron beam Lithography Polymethyl-methacrylate (PMMA Lithography > Technique Integrated circuits Nanotechnology
Online Access:	http://dspace.unimap.edu.my/xmlui/handle/123456789/2390
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