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Optimization of 950K PMMA resists for Nano-application using Statistical Design Expert

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書誌詳細
第一著者:	Khoo Chien Chin
その他の著者:	Uda Hashim, P.M. Dr. (Advisor)
フォーマット:	Learning Object
言語:	English
出版事項:	Universiti Malaysia Perlis 2008
主題:	Lithography, Electron beam Lithography Polymethyl-methacrylate (PMMA Lithography > Technique Integrated circuits Nanotechnology
オンライン･アクセス:	http://dspace.unimap.edu.my/xmlui/handle/123456789/2390
タグ:	タグ追加タグなし, このレコードへの初めてのタグを付けませんか!

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