Fabrication of nanopore with different parameters in depth and diameter on silicon substrate using one-step focused ion beam milling
Focused ion beam (FIB) technique uses a focused beam of ions to scan the surface of a specimen, analogous to the way scanning electron microscope utilizes electrons. Recent developments of FIB technology have emerged as one of the most advanced multifunctional platforms for nanofabrication. It is a...
Saved in:
Main Author: | Sabili, Sufi Nazihah |
---|---|
Format: | Thesis |
Language: | English |
Published: |
2022
|
Subjects: | |
Online Access: | http://eprints.utm.my/id/eprint/99715/1/SufiNazihahSabiliMMJIIT2022.pdf http://eprints.utm.my/id/eprint/99715/ http://dms.library.utm.my:8080/vital/access/manager/Repository/vital:150814 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
The effect of depth on fabrication of nanopore using one-step focused ion beam milling for DNA sequencing application
by: Sabili, Sufi Nazihah, et al.
Published: (2020) -
Focused ion beam machining of silicon
by: Hung, NguyenPhu, et al.
Published: (2002) -
Fabrication of conical micropore structure on silicon nitride/silicon using focused ion beam milling for biosensor application
by: Zainal Ariffin, Nur Hamizah, et al.
Published: (2015) -
Surface integrity and removal rate of silicon sputtered with focused ion beam
by: Hung, NguyenPhu, et al.
Published: (2001) -
Thermoelectrical properties of silicon substrates with nanopores synthesized by metal-assisted chemical etching
by: Li, Yijie, et al.
Published: (2020)