Focused ion beam machining of silicon
This paper optimizes the parameters of a focused gallium ion beam system for the micromachining of single-crystal silicon. The effect of the parameters on the surface integrity and material removal rate (MRR) were studied. The surface integrity and machined features were measured with a scanning pro...
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| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier BV
2002
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| Subjects: | |
| Online Access: | http://irep.iium.edu.my/27110/1/022_JMPT_127%282%29_256-260.pdf http://irep.iium.edu.my/27110/ http://www.sciencedirect.com/science/article/pii/S092401360200153X |
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