3D simulation investigating ZnO NWFET characteristics

• Main Authors: Ditshego, Nonofo M. J., Mohamed Sultan, Suhana
• Format: Article
• Language: English
• Published: Trans Tech Publications Ltd 2019
• Subjects: TK Electrical engineering. Electronics Nuclear engineering
• Online Access: http://eprints.utm.my/id/eprint/87985/1/SuhanaMohamedSultan2019_3DSimulationInvestigatingZnoNweetCharacteristics.pdf; http://eprints.utm.my/id/eprint/87985/; http://dx.doi.org/10.4028/www.scientific.net/JNanoR.58.40

3D Simulation was carried out and compared with fabricated ZnO NWFET. The device had the following electrical output characteristics: mobility value of 10.0 cm2 /Vs at a drain voltage of 1.0 V, threshold voltage of 24 V, and subthreshold slope (SS) of 1500 mV/decade. The simulation showed that the device output results are influenced by two main issues: (i) contact resistance (Rcon ≈ 11.3 MΩ) and (ii) interface state trapped charge number density (QIT = 3.79 x 1015 cm-2). The QIT was derived from the Gaussian distribution that depends on two parameters added together. These parameters are: an acceptor-like exponential band tail function gGA(E) and an acceptor-like Gaussian deep state function gTA(E). By de-embedding the contact resistance, the simulation is able to improve the device by producing excellent field effect mobility of 126.9 cm2 /Vs.