Mobility diminution in a nano-MOSFET due to carrier injection from the ohmic contacts
The mobility is being ballistic when the mean free path in a nanoscale transistor exceeds the channel length. The ballistic mobility is modeled and interpreted by analyzing transient velocity response to the electric field. The new model includes the transit-time delay that may become comparable to...
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American Institute of Physics.
2011
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my.utm.293612017-02-04T08:44:30Z http://eprints.utm.my/id/eprint/29361/ Mobility diminution in a nano-MOSFET due to carrier injection from the ohmic contacts Riyadi, M. A. Tan, Michael Loong Peng Hashim, Abdul Manaf Arora, Vijay Kumar TK Electrical engineering. Electronics Nuclear engineering The mobility is being ballistic when the mean free path in a nanoscale transistor exceeds the channel length. The ballistic mobility is modeled and interpreted by analyzing transient velocity response to the electric field. The new model includes the transit-time delay that may become comparable to or smaller than the scattering-limited mean free time. For an applied voltage of 0.1 V or lower, the transient response effect degrades the mobility below its long-length limit. The model includes the carrier injection from the Ohmic contacts which can explain the mobility diminution in the nanoscale MOSFET. As a result, the new model shows excellent agreement with the ballistic mobility experimental data. American Institute of Physics. 2011 Book Section PeerReviewed Riyadi, M. A. and Tan, Michael Loong Peng and Hashim, Abdul Manaf and Arora, Vijay Kumar (2011) Mobility diminution in a nano-MOSFET due to carrier injection from the ohmic contacts. In: AIP Conference Proceedings. American Institute of Physics., pp. 169-174. ISBN 978-073540903-3 http://dx.doi.org/10.1063/1.3586978 10.1063/1.3586978 |
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TK Electrical engineering. Electronics Nuclear engineering Riyadi, M. A. Tan, Michael Loong Peng Hashim, Abdul Manaf Arora, Vijay Kumar Mobility diminution in a nano-MOSFET due to carrier injection from the ohmic contacts |
description |
The mobility is being ballistic when the mean free path in a nanoscale transistor exceeds the channel length. The ballistic mobility is modeled and interpreted by analyzing transient velocity response to the electric field. The new model includes the transit-time delay that may become comparable to or smaller than the scattering-limited mean free time. For an applied voltage of 0.1 V or lower, the transient response effect degrades the mobility below its long-length limit. The model includes the carrier injection from the Ohmic contacts which can explain the mobility diminution in the nanoscale MOSFET. As a result, the new model shows excellent agreement with the ballistic mobility experimental data. |
format |
Book Section |
author |
Riyadi, M. A. Tan, Michael Loong Peng Hashim, Abdul Manaf Arora, Vijay Kumar |
author_facet |
Riyadi, M. A. Tan, Michael Loong Peng Hashim, Abdul Manaf Arora, Vijay Kumar |
author_sort |
Riyadi, M. A. |
title |
Mobility diminution in a nano-MOSFET due to carrier injection from the ohmic contacts |
title_short |
Mobility diminution in a nano-MOSFET due to carrier injection from the ohmic contacts |
title_full |
Mobility diminution in a nano-MOSFET due to carrier injection from the ohmic contacts |
title_fullStr |
Mobility diminution in a nano-MOSFET due to carrier injection from the ohmic contacts |
title_full_unstemmed |
Mobility diminution in a nano-MOSFET due to carrier injection from the ohmic contacts |
title_sort |
mobility diminution in a nano-mosfet due to carrier injection from the ohmic contacts |
publisher |
American Institute of Physics. |
publishDate |
2011 |
url |
http://eprints.utm.my/id/eprint/29361/ http://dx.doi.org/10.1063/1.3586978 |
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1643648283604680704 |
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13.160551 |