Effect of selective lateral chromium doping by rf magnetron sputtering on the structural, and opto-electrical properties of nickel oxide
In this study, chromium (Cr)-doped nickel oxide (NiO) thin films were deposited by employing selective lateral doping of Cr in NiO by radio-frequency magnetron sputtering at different doping times ranging from 0 s (undoped) to 80 s. The structural, optical, and electrical properties of the resulting...
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Main Authors: | Jamal M.S., Sobayel K., Misran H., Nasrin T., Althubeiti K., Alkhammash H.I., Shahiduzzaman M., Sopian K., Amin N., Akhtaruzzaman M. |
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Other Authors: | 55887499100 |
Format: | Article |
Published: |
MDPI
2023
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