Impact of ar flow rates on micro-structural properties of ws2 thin film by rf magnetron sputtering

• Main Authors: Akhtaruzzaman, Md, Shahiduzzaman, Md, Amin, Nowshad, Muhammad, Ghulam, Islam, Mohammad Aminul, Bin Rafiq, Khan Sobayel, Sopian, Kamaruzzaman
• Format: Article
• Published: MDPI 2021
• Subjects: TA Engineering (General). Civil engineering (General); TK Electrical engineering. Electronics Nuclear engineering
• Online Access: http://eprints.um.edu.my/28710/

Tungsten disulfide (WS2) thin films were deposited on soda-lime glass (SLG) substrates using radio frequency (RF) magnetron sputtering at different Ar flow rates (3 to 7 sccm). The effect of Ar flow rates on the structural, morphology, and electrical properties of the WS2 thin films was investigated...