Effect of selective lateral chromium doping by rf magnetron sputtering on the structural, and opto-electrical properties of nickel oxide
In this study, chromium (Cr)-doped nickel oxide (NiO) thin films were deposited by employing selective lateral doping of Cr in NiO by radio-frequency magnetron sputtering at different doping times ranging from 0 s (undoped) to 80 s. The structural, optical, and electrical properties of the resulting...
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| Main Authors: | , , , , , , , , , |
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| Format: | Article |
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MDPI
2023
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