Interplay between variable direct current sputtering deposition process parameters and properties of ZnO:Ga thin films
Conductive films; Gallium compounds; Grain growth; II-VI semiconductors; Infrared spectroscopy; Oxide films; Sputtering; Zinc oxide; Gallium doped zinc oxides; Optoelectronic properties; Spatial variations; Sputtering deposition; Transparent conductive oxides; Thin films
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Main Authors: | Ferdaous M.T., Shahahmadi S.A., Sapeli M.M.I., Chelvanathan P., Akhtaruzzaman M., Tiong S.K., Amin N. |
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Other Authors: | 55567613100 |
Format: | Article |
Published: |
Elsevier B.V.
2023
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