Characterization of robust alignment mark to improve alignment performance
Link to publisher's homepage at http://ieeexplore.ieee.org
Saved in:
Main Authors: | Normah, Ahmad, Uda, Hashim, Mohd Jefrey, Manaf, Kader, Ibrahim |
---|---|
Format: | Article |
Language: | English |
Published: |
Institute of Electrical and Electronics Engineering (IEEE)
2009
|
Subjects: | |
Online Access: | http://dspace.unimap.edu.my/xmlui/handle/123456789/6689 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Effect of alignment mark depth on alignment signal behavior in advanced lithography
by: Normah, Ahmad, et al.
Published: (2017) -
Alignment mark architecture effect on alignment signal behavior in advanced lithography
by: Normah, Ahmad, et al.
Published: (2009) -
Effect of alignment mark architecture on alignment signal behavior in advanced lithography
by: Normah, Ahmad, et al.
Published: (2009) -
Characterization of alignment mark to obtain reliable alignment performance in advanced lithography
by: Normah, Ahmad
Published: (2019) -
An investigation of the 85th percentile operating speed models on horizontal and vertical alignments for two-lane rural highways: A case study
by: Syed Khairi, Syed Abbas, Engr., et al.
Published: (2013)