Cover Image

Characterization of robust alignment mark to improve alignment performance

Link to publisher's homepage at http://ieeexplore.ieee.org

Saved in:
Bibliographic Details
Main Authors: Normah, Ahmad, Uda, Hashim, Mohd Jefrey, Manaf, Kader, Ibrahim
Format: Article
Language:English
Published: Institute of Electrical and Electronics Engineering (IEEE) 2009
Subjects:
Alignment
Alignment mark
Alignment performance
Alignment signal
Overlay
Integrated circuit technology
Quality control
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/6689
Tags: Add Tag
No Tags, Be the first to tag this record!
id my.unimap-6689
record_format dspace
spelling my.unimap-66892010-11-23T05:12:18Z Characterization of robust alignment mark to improve alignment performance Normah, Ahmad Uda, Hashim Mohd Jefrey, Manaf Kader, Ibrahim Alignment Alignment mark Alignment performance Alignment signal Overlay Integrated circuit technology Quality control Link to publisher's homepage at http://ieeexplore.ieee.org Overlay requirement is one of the biggest obstacles in achieving a very small feature. With the continued growth of small feature size, overlay requirement becomes tighter. Such a tight requirement requires a very high performance in alignment. Alignment performance is greatly dependent on alignment signal quality. Variation in metal deposition thickness, polishing time, and mark depth may deteriorate the alignment signals quality. In this paper, different types of alignment mark was used to evaluate the alignment performance in various process environment. Based from the findings, two grating alignment mark gives the worst alignment performance, which clearly indicates the unsuitability to use in production environment. 2009-08-06T12:42:30Z 2009-08-06T12:42:30Z 2006 Article p.518-523 978-1-4244-0730-9 1089-8190 http://ieeexplore.ieee.org/xpls/abs_all.jsp?=&arnumber=4456505 http://hdl.handle.net/123456789/6689 en Proceedings of the IEEE/CPMT International Electronics Manufacturing Technology (IEMT) Symposium Institute of Electrical and Electronics Engineering (IEEE)
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Alignment
Alignment mark
Alignment performance
Alignment signal
Overlay
Integrated circuit technology
Quality control
spellingShingle Alignment
Alignment mark
Alignment performance
Alignment signal
Overlay
Integrated circuit technology
Quality control
Normah, Ahmad
Uda, Hashim
Mohd Jefrey, Manaf
Kader, Ibrahim
Characterization of robust alignment mark to improve alignment performance
description Link to publisher's homepage at http://ieeexplore.ieee.org
format Article
author Normah, Ahmad
Uda, Hashim
Mohd Jefrey, Manaf
Kader, Ibrahim
author_facet Normah, Ahmad
Uda, Hashim
Mohd Jefrey, Manaf
Kader, Ibrahim
author_sort Normah, Ahmad
title Characterization of robust alignment mark to improve alignment performance
title_short Characterization of robust alignment mark to improve alignment performance
title_full Characterization of robust alignment mark to improve alignment performance
title_fullStr Characterization of robust alignment mark to improve alignment performance
title_full_unstemmed Characterization of robust alignment mark to improve alignment performance
title_sort characterization of robust alignment mark to improve alignment performance
publisher Institute of Electrical and Electronics Engineering (IEEE)
publishDate 2009
url http://dspace.unimap.edu.my/xmlui/handle/123456789/6689
_version_ 1643788578132590592
score 13.222552

Similar Items