Subnanometer poly-silicon gap structure formation: Comparison study between size expansion and size reduction

• Main Authors: Uda, Hashim, Prof. Dr., Nazwa, Taib, Thikra, S. Dhahi
• Other Authors: [e-mail]
• Format: Working Paper
• Language: English
• Published: American Institute of Physics. 2013
• Subjects: E-beam lithography (EBL); Lateral nanogap; Single molecule; Size Expansion Technique (SET); Size Reduction Technique (SRT)
• Online Access: http://dspace.unimap.edu.my/xmlui/handle/123456789/26634

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