Hybrid plasma enhanced chemical vapour deposition/sputtering system for preparation of luminescent silicon carbon films / Nur Maisarah binti Abdul Rashid

• Main Author: Abdul Rashid, Nur Maisarah
• Format: Thesis
• Published: 2013
• Subjects: Q Science (General); QC Physics
• Online Access: http://studentsrepo.um.edu.my/4414/1/THESIS_MSc_NUR_MAISARAH_BINTI_ABDUL_RASHID_SGR090108.pdf; http://studentsrepo.um.edu.my/4414/

Radio frequency plasma enhanced chemical vapour deposition (r.f PECVD) process is a well-established technique for depositing amorphous silicon carbon (a-SiC) films. However, an environmental friendly deposition technique which does not involve the use of toxic gas, silane (SiH4) is a much preferred...