Effects of rf power on the structural properties of carbon nitride thin films prepared by plasma enhanced chemical vapour deposition

• Main Authors: Othman, Maisara, Ritikos, Richard, Khanis, Noor Hamizah, Rashid, Nur Maisarah Abdul, Rahman, Saadah Abdul, Gani, Siti Meriam Ab, Muhamad, Muhamad Rasat
• Format: Article
• Published: Elsevier 2011
• Subjects: Q Science (General); QC Physics
• Online Access: http://eprints.um.edu.my/7349/; https://doi.org/10.1016/j.tsf.2011.01.065

Carbon nitride (CR(x)) thin films were deposited by radio frequency plasma enhanced chemical vapour deposition (rfPECVD) technique from a gas mixture of methane (CH(4)), hydrogen (H(2)) and nitrogen (N(2)). The effects of rf power on the structural properties of CN(x) thin films were discussed in th...