Hot-wire plasma enhanced chemical vapour deposition system for preparation of silicon carbide thin films / Aniszawati Azis

• Main Author: Aniszawati, Azis
• Format: Thesis
• Published: 2012
• Subjects: Q Science (General)
• Online Access: http://studentsrepo.um.edu.my/3841/1/CONTENTS_F.pdf; http://studentsrepo.um.edu.my/3841/2/Chapter_1_F.pdf; http://studentsrepo.um.edu.my/3841/3/Chapter_2_F.pdf; http://studentsrepo.um.edu.my/3841/4/Chapter_3_F.pdf; http://studentsrepo.um.edu.my/3841/5/Chapter_4_F.pdf; http://studentsrepo.um.edu.my/3841/6/Chapter_5_F.pdf; http://studentsrepo.um.edu.my/3841/7/Chapter_6_F.pdf; http://studentsrepo.um.edu.my/3841/8/REFERENCES_F.pdf; http://studentsrepo.um.edu.my/3841/9/APPENDIX_F.pdf; http://pendeta.um.edu.my/client/default/search/results?qu=Hot-wire+plasma+enhanced+chemical+vapour+deposition+system+for+preparation+of+silicon+carbide+thin+films&te=; http://studentsrepo.um.edu.my/3841/

This research offers insights on the function of a home-built plasma enhanced chemical vapor deposition (PECVD) system in the preparation of silicon carbide (SiC) thin films. The work started with designing and building a reaction chamber for the PECVD system that would utilize radio frequency (R...