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Optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching

A top-down silicon nanowire fabrication using a combination of optical lithography and orientation dependent etching has been developed using Silicon-on Insulator (SOI) as the starting substrate. The design of experiments for the optimization of the process flow especially on the orientation depen...

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Main Authors: Za'bah, Nor Farahidah, Kwa, Kelvin S. K., O'Neill, Anthony
Format: Article
Language:English
Published: Trans Tech Publications, Switzerland 2013
Subjects:
QD Chemistry
TS Manufactures
Online Access:http://irep.iium.edu.my/28378/1/Optimization_of_the_Process_Modules_for_a_Top-Down_Silicon_NW.pdf
http://irep.iium.edu.my/28378/
http://www.scientific.net/AMR.629.115
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spelling my.iium.irep.283782013-02-19T05:12:25Z http://irep.iium.edu.my/28378/ Optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching Za'bah, Nor Farahidah Kwa, Kelvin S. K. O'Neill, Anthony QD Chemistry TS Manufactures A top-down silicon nanowire fabrication using a combination of optical lithography and orientation dependent etching has been developed using Silicon-on Insulator (SOI) as the starting substrate. The design of experiments for the optimization of the process flow especially on the orientation dependent etching using potassium hydroxide (KOH) and Tetra-Methyl Ammonium Hydroxide (TMAH) are presented in this paper. Based on the etching experiments using silicon substrates, KOH with added isopropyl alcohol (IPA) had shown to have a consistent etch rate with acceptable silicon surface roughness as compared with its other counterparts. The concern regarding the effect of line edge roughness (LER) as a result of optical lithography was highlighted and, therefore, the optimization of the patterning procedure was also discussed and presented. Trans Tech Publications, Switzerland 2013 Article REM application/pdf en http://irep.iium.edu.my/28378/1/Optimization_of_the_Process_Modules_for_a_Top-Down_Silicon_NW.pdf Za'bah, Nor Farahidah and Kwa, Kelvin S. K. and O'Neill, Anthony (2013) Optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching. Advanced Materials Research, 629. pp. 115-121. ISSN 1022-6680 http://www.scientific.net/AMR.629.115
institution Universiti Islam Antarabangsa Malaysia
building IIUM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider International Islamic University Malaysia
content_source IIUM Repository (IREP)
url_provider http://irep.iium.edu.my/
language English
topic QD Chemistry
TS Manufactures
spellingShingle QD Chemistry
TS Manufactures
Za'bah, Nor Farahidah
Kwa, Kelvin S. K.
O'Neill, Anthony
Optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching
description A top-down silicon nanowire fabrication using a combination of optical lithography and orientation dependent etching has been developed using Silicon-on Insulator (SOI) as the starting substrate. The design of experiments for the optimization of the process flow especially on the orientation dependent etching using potassium hydroxide (KOH) and Tetra-Methyl Ammonium Hydroxide (TMAH) are presented in this paper. Based on the etching experiments using silicon substrates, KOH with added isopropyl alcohol (IPA) had shown to have a consistent etch rate with acceptable silicon surface roughness as compared with its other counterparts. The concern regarding the effect of line edge roughness (LER) as a result of optical lithography was highlighted and, therefore, the optimization of the patterning procedure was also discussed and presented.
format Article
author Za'bah, Nor Farahidah
Kwa, Kelvin S. K.
O'Neill, Anthony
author_facet Za'bah, Nor Farahidah
Kwa, Kelvin S. K.
O'Neill, Anthony
author_sort Za'bah, Nor Farahidah
title Optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching
title_short Optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching
title_full Optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching
title_fullStr Optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching
title_full_unstemmed Optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching
title_sort optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching
publisher Trans Tech Publications, Switzerland
publishDate 2013
url http://irep.iium.edu.my/28378/1/Optimization_of_the_Process_Modules_for_a_Top-Down_Silicon_NW.pdf
http://irep.iium.edu.my/28378/
http://www.scientific.net/AMR.629.115
_version_ 1643609492956381184
score 13.160551

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