Optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching

• Main Authors: Za'bah, Nor Farahidah, Kwa, Kelvin S. K., O'Neill, Anthony
• Format: Article
• Language: English
• Published: Trans Tech Publications, Switzerland 2013
• Subjects: QD Chemistry; TS Manufactures
• Online Access: http://irep.iium.edu.my/28378/1/Optimization_of_the_Process_Modules_for_a_Top-Down_Silicon_NW.pdf; http://irep.iium.edu.my/28378/; http://www.scientific.net/AMR.629.115

A top-down silicon nanowire fabrication using a combination of optical lithography and orientation dependent etching has been developed using Silicon-on Insulator (SOI) as the starting substrate. The design of experiments for the optimization of the process flow especially on the orientation depen...