The study on the aspect ratio of Atomic Force Microscope (AFM) measurements for Triangular Silicon Nanowire

• Main Authors: Za'bah, Nor Farahidah, Kwa, Kelvin S. K., O'Neill, Anthony
• Format: Conference or Workshop Item
• Language: English; English
• Published: 2013
• Subjects: TA213 Engineering machinery, tools, and implements; TA401 Materials of engineering and construction
• Online Access: http://irep.iium.edu.my/33715/1/1569793019_The_Study_on_the_Aspect_Ratio_of_AFM_Measurements_for_Triangular_Si_NW.pdf; http://irep.iium.edu.my/33715/4/IEEE-presentation_schedule.pdf; http://irep.iium.edu.my/33715/; http://www.ieeemalaysia-eds.org/rsm2013/index.php?option=com_content&view=article&id=46:2013-ieee-regional-symposium-on-micro-and-nanoelectronics&Itemid=28

A top-down silicon nanowire fabrication using a combination of optical lithography and orientation dependent etching (ODE) has been developed using <100> Silicon-on Insulator (SOI) as the starting substrate. The use of ODE etchant such as potassium hydroxide (KOH) and Tetra-Methyl Ammonium H...