Focused ion beam machining of silicon

This paper optimizes the parameters of a focused gallium ion beam system for the micromachining of single-crystal silicon. The effect of the parameters on the surface integrity and material removal rate (MRR) were studied. The surface integrity and machined features were measured with a scanning pro...

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Bibliographic Details
Main Authors: Hung, NguyenPhu, Fu, Yongqi, Ali, Mohammad Yeakub
Format: Article
Language:English
Published: Elsevier BV 2002
Subjects:
Online Access:http://irep.iium.edu.my/27110/1/022_JMPT_127%282%29_256-260.pdf
http://irep.iium.edu.my/27110/
http://www.sciencedirect.com/science/article/pii/S092401360200153X
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