Electrical characterization of gold contact on porous silicon layers
Investigation on metallic contact on porous silicon (PS) layers is typically important before final integration into application devices. The electrical characterization of Au thickness of 100 nm and ∼210 nm on ∼3 μm and ∼6 μm PS thickness on PS were studied by measuring the current-voltage (I-V) re...
Saved in:
Main Authors: | , |
---|---|
Format: | Conference or Workshop Item |
Language: | English |
Published: |
2017
|
Subjects: | |
Online Access: | http://eprints.utm.my/id/eprint/97137/1/MasturaShafinazZainalAbidin2017_ElectricalCharacterizationofGoldContact.pdf http://eprints.utm.my/id/eprint/97137/ http://dx.doi.org/10.1109/RSM.2017.8069138 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
id |
my.utm.97137 |
---|---|
record_format |
eprints |
spelling |
my.utm.971372022-09-15T06:45:08Z http://eprints.utm.my/id/eprint/97137/ Electrical characterization of gold contact on porous silicon layers Hussin, Muhamad Hazwan Aizat Zainal Abidin, Mastura Shafinaz TK Electrical engineering. Electronics Nuclear engineering Investigation on metallic contact on porous silicon (PS) layers is typically important before final integration into application devices. The electrical characterization of Au thickness of 100 nm and ∼210 nm on ∼3 μm and ∼6 μm PS thickness on PS were studied by measuring the current-voltage (I-V) response. The PS layers of n-type oriented silicon (Si) wafer were prepared by electrochemical etching. Au was deposited on the PS layers using Q150RS automated sputter coater. Based on scanning electron microscope (SEM) images, the thickness of PS was confirmed as 3.07 μm and 6.15 μm for respective samples. The average pore diameter was determined with the aid of ImageJ and Matlab by applying image processing analysis. There were found to be 17.91 μm and 27.26 μm respectively. The I-V curve of PS with Au contact showed significant tendency of Ohmic behaviour compared to non-PS samples that shows Schottky behaviour. The higher conductivity was obtained from sample 3.07 μm of PS thickness with 100 nm Au. Based on this analysis, it can be concluded that thickness of Au and thickness of PS affect the performance of Au-PS device as the conductivity increases as the thickness of Au on PS layers was decreased. 2017 Conference or Workshop Item PeerReviewed application/pdf en http://eprints.utm.my/id/eprint/97137/1/MasturaShafinazZainalAbidin2017_ElectricalCharacterizationofGoldContact.pdf Hussin, Muhamad Hazwan Aizat and Zainal Abidin, Mastura Shafinaz (2017) Electrical characterization of gold contact on porous silicon layers. In: 11th IEEE Regional Symposium on Micro and Nanoelectronics, RSM 2017, 23 - 25 August 2017, Batu Ferringhi, Penang. http://dx.doi.org/10.1109/RSM.2017.8069138 |
institution |
Universiti Teknologi Malaysia |
building |
UTM Library |
collection |
Institutional Repository |
continent |
Asia |
country |
Malaysia |
content_provider |
Universiti Teknologi Malaysia |
content_source |
UTM Institutional Repository |
url_provider |
http://eprints.utm.my/ |
language |
English |
topic |
TK Electrical engineering. Electronics Nuclear engineering |
spellingShingle |
TK Electrical engineering. Electronics Nuclear engineering Hussin, Muhamad Hazwan Aizat Zainal Abidin, Mastura Shafinaz Electrical characterization of gold contact on porous silicon layers |
description |
Investigation on metallic contact on porous silicon (PS) layers is typically important before final integration into application devices. The electrical characterization of Au thickness of 100 nm and ∼210 nm on ∼3 μm and ∼6 μm PS thickness on PS were studied by measuring the current-voltage (I-V) response. The PS layers of n-type oriented silicon (Si) wafer were prepared by electrochemical etching. Au was deposited on the PS layers using Q150RS automated sputter coater. Based on scanning electron microscope (SEM) images, the thickness of PS was confirmed as 3.07 μm and 6.15 μm for respective samples. The average pore diameter was determined with the aid of ImageJ and Matlab by applying image processing analysis. There were found to be 17.91 μm and 27.26 μm respectively. The I-V curve of PS with Au contact showed significant tendency of Ohmic behaviour compared to non-PS samples that shows Schottky behaviour. The higher conductivity was obtained from sample 3.07 μm of PS thickness with 100 nm Au. Based on this analysis, it can be concluded that thickness of Au and thickness of PS affect the performance of Au-PS device as the conductivity increases as the thickness of Au on PS layers was decreased. |
format |
Conference or Workshop Item |
author |
Hussin, Muhamad Hazwan Aizat Zainal Abidin, Mastura Shafinaz |
author_facet |
Hussin, Muhamad Hazwan Aizat Zainal Abidin, Mastura Shafinaz |
author_sort |
Hussin, Muhamad Hazwan Aizat |
title |
Electrical characterization of gold contact on porous silicon layers |
title_short |
Electrical characterization of gold contact on porous silicon layers |
title_full |
Electrical characterization of gold contact on porous silicon layers |
title_fullStr |
Electrical characterization of gold contact on porous silicon layers |
title_full_unstemmed |
Electrical characterization of gold contact on porous silicon layers |
title_sort |
electrical characterization of gold contact on porous silicon layers |
publishDate |
2017 |
url |
http://eprints.utm.my/id/eprint/97137/1/MasturaShafinazZainalAbidin2017_ElectricalCharacterizationofGoldContact.pdf http://eprints.utm.my/id/eprint/97137/ http://dx.doi.org/10.1109/RSM.2017.8069138 |
_version_ |
1744353717044379648 |
score |
13.160551 |