VHF-PECVD fabrication parameters dependent morphologyvariation of gold catalyst assisted silicon thin film growth

• Main Authors: Hamzah, Khaidzir, Mohd. Yassin, M. Abdullah Izat, Ghoshal, Sib Krishna Rishna, M., Akmal Hasanudin, Ismail, Abd. Khamim
• Format: Article
• Language: English
• Published: Penerbit Universiti Teknologi Malaysia 2015
• Subjects: TP Chemical technology
• Online Access: http://eprints.utm.my/55760/1/KhaidzirHamzahMAbdullahIzatMohdYassinSibKrishnaGhoshal2015_VHFPECVDFabricationParametersDependentMorphologyvariation.pdf; http://eprints.utm.my/55760/; http://dx.doi.org/http://dx.doi.org/10.11113/jt.v76.4030

Achieving two dimensional quantum structure of silicon with well-defined tunable morphology is an outstanding issue. We present the preliminary results on fabrication parameters dependent silicon thin film production using VHF-PECVD method. Five samples are prepared on Si(100) substrate with gold (A...