Effect of atomic layer deposition temperature on the performance of top-down ZnO nanowire transistors

• Main Authors: Mohamed Sulthan, Suhana, Ditshego, Nonofo J., Gunn, Robert, Ashburn, Peter, Chong, Harold M. H.
• Format: Article
• Language: English
• Published: Springer New York LLC 2014
• Subjects: TK Electrical engineering. Electronics Nuclear engineering
• Online Access: http://eprints.utm.my/id/eprint/52478/1/SuhanaMohamedSulthan2014_Effectofatomiclayer.pdf; http://eprints.utm.my/id/eprint/52478/; http://dx.doi.org/10.1186/1556-276X-9-517

This paper studies the effect of atomic layer deposition (ALD) temperature on the performance of top-down ZnO nanowire transistors. Electrical characteristics are presented for 10-μm ZnO nanowire field-effect transistors (FETs) and for deposition temperatures in the range 120°C to 210°C. Well-behaved transistor output characteristics are obtained for all deposition temperatures. It is shown that the maximum field-effect mobility occurs for an ALD temperature of 190°C. This maximum field-effect mobility corresponds with a maximum Hall effect bulk mobility and with a ZnO film that is stoichiometric. The optimized transistors have a field-effect mobility of 10 cm(2)/V.s, which is approximately ten times higher than can typically be achieved in thin-film amorphous silicon transistors. Furthermore, simulations indicate that the drain current and field-effect mobility extraction are limited by the contact resistance. When the effects of contact resistance are de-embedded, a field-effect mobility of 129 cm(2)/V.s is obtained. This excellent result demonstrates the promise of top-down ZnO nanowire technology for a wide variety of applications such as high-performance thin-film electronics, flexible electronics, and biosensing