Aluminum-copper bilayers thin films deposited at room temperature by RF magnetron sputtering
In this work, the effects of room temperature deposition on the structural properties of Al-Cu bilayers thin films were investigated. The bilayers were sputter deposited by RF magnetron sputtering on Si {100} wafers without substrate heating. The thickness of each layer is approximately 500 nm thick...
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Online Access: | http://eprints.utm.my/id/eprint/51753/1/ZulhelmiAlifAbdul2014_Aluminum-copperbilayersthinfilms.pdf http://eprints.utm.my/id/eprint/51753/ http://dx.doi.org/10.4028/www.scientific.net/AMM.606.105 |
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my.utm.517532018-08-27T03:24:32Z http://eprints.utm.my/id/eprint/51753/ Aluminum-copper bilayers thin films deposited at room temperature by RF magnetron sputtering Abdul Halim, Zulhelmi Alif Mat Yajid, Muhamad Azizi Mohd. Rosli, Zulkifli Mohamad Ali, Riyaz Ahmad TJ Mechanical engineering and machinery In this work, the effects of room temperature deposition on the structural properties of Al-Cu bilayers thin films were investigated. The bilayers were sputter deposited by RF magnetron sputtering on Si {100} wafers without substrate heating. The thickness of each layer is approximately 500 nm thick. Characterization were performed with grazing incidence X-ray diffraction (XRD), field emission scanning electron microscope (FE-SEM) with chemical analysis by energy dispersive X-ray (EDX) and atomic force microscope (AFM). From deposition, polycrystalline Al and Cu thin films with {111} preferred orientation were grown on the surface of the substrate. The bilayers is nanocrystalline, having very fine crystallites size of less than 20 nm. With minimal microstrain influence, each layer shows different morphologies between the columnar and non columnar structure. AFM analysis revealed that the bilayers top surface exhibits higher surface roughness (Ra = 20 nm) due to low adatoms surface mobility during deposition Trans Tech Publication 2014 Article PeerReviewed application/pdf en http://eprints.utm.my/id/eprint/51753/1/ZulhelmiAlifAbdul2014_Aluminum-copperbilayersthinfilms.pdf Abdul Halim, Zulhelmi Alif and Mat Yajid, Muhamad Azizi and Mohd. Rosli, Zulkifli and Mohamad Ali, Riyaz Ahmad (2014) Aluminum-copper bilayers thin films deposited at room temperature by RF magnetron sputtering. Applied Mechanics and Materials, 606 . pp. 105-109. ISSN 1660-9336 http://dx.doi.org/10.4028/www.scientific.net/AMM.606.105 DOI: 10.4028/www.scientific.net/AMM.606.105 |
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TJ Mechanical engineering and machinery Abdul Halim, Zulhelmi Alif Mat Yajid, Muhamad Azizi Mohd. Rosli, Zulkifli Mohamad Ali, Riyaz Ahmad Aluminum-copper bilayers thin films deposited at room temperature by RF magnetron sputtering |
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In this work, the effects of room temperature deposition on the structural properties of Al-Cu bilayers thin films were investigated. The bilayers were sputter deposited by RF magnetron sputtering on Si {100} wafers without substrate heating. The thickness of each layer is approximately 500 nm thick. Characterization were performed with grazing incidence X-ray diffraction (XRD), field emission scanning electron microscope (FE-SEM) with chemical analysis by energy dispersive X-ray (EDX) and atomic force microscope (AFM). From deposition, polycrystalline Al and Cu thin films with {111} preferred orientation were grown on the surface of the substrate. The bilayers is nanocrystalline, having very fine crystallites size of less than 20 nm. With minimal microstrain influence, each layer shows different morphologies between the columnar and non columnar structure. AFM analysis revealed that the bilayers top surface exhibits higher surface roughness (Ra = 20 nm) due to low adatoms surface mobility during deposition |
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Article |
author |
Abdul Halim, Zulhelmi Alif Mat Yajid, Muhamad Azizi Mohd. Rosli, Zulkifli Mohamad Ali, Riyaz Ahmad |
author_facet |
Abdul Halim, Zulhelmi Alif Mat Yajid, Muhamad Azizi Mohd. Rosli, Zulkifli Mohamad Ali, Riyaz Ahmad |
author_sort |
Abdul Halim, Zulhelmi Alif |
title |
Aluminum-copper bilayers thin films deposited at room temperature by RF magnetron sputtering |
title_short |
Aluminum-copper bilayers thin films deposited at room temperature by RF magnetron sputtering |
title_full |
Aluminum-copper bilayers thin films deposited at room temperature by RF magnetron sputtering |
title_fullStr |
Aluminum-copper bilayers thin films deposited at room temperature by RF magnetron sputtering |
title_full_unstemmed |
Aluminum-copper bilayers thin films deposited at room temperature by RF magnetron sputtering |
title_sort |
aluminum-copper bilayers thin films deposited at room temperature by rf magnetron sputtering |
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Trans Tech Publication |
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2014 |
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http://eprints.utm.my/id/eprint/51753/1/ZulhelmiAlifAbdul2014_Aluminum-copperbilayersthinfilms.pdf http://eprints.utm.my/id/eprint/51753/ http://dx.doi.org/10.4028/www.scientific.net/AMM.606.105 |
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