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MOS Transistor Mask Design Using SEM Based E-Beam Lithography

Prof. Dr. Uda Hashim and his team won silver for MOS Transistor Mask Design Using SEM Based E-Beam Lithography at ITEX 2006, 19th - 21st May 2006 at Kuala Lumpur Convention Centre (KLCC), Kuala Lumpur.

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Bibliographic Details
Main Authors: Uda, Hashim, Prof. Dr., Nur Hamidah, Abdul Halim, Mohammad Nuzaihan, Md Nor, Zul Azhar, Zahid Jamal, Prof. Dr.
Other Authors: uda@kukum.edu.my
Format: Image
Language:English
Published: Malaysian Invention & Design Society (MINDS) 2010
Subjects:
E-Beam Lithography (EBL)
MOS Transistor Mask Design
KUKUM > Research
International Invention, Innovation & Technology Exhibition
ITEX 2006
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/8345
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spelling my.unimap-83452010-07-20T04:51:51Z MOS Transistor Mask Design Using SEM Based E-Beam Lithography Uda, Hashim, Prof. Dr. Nur Hamidah, Abdul Halim Mohammad Nuzaihan, Md Nor Zul Azhar, Zahid Jamal, Prof. Dr. uda@kukum.edu.my E-Beam Lithography (EBL) MOS Transistor Mask Design KUKUM -- Research International Invention, Innovation & Technology Exhibition ITEX 2006 Prof. Dr. Uda Hashim and his team won silver for MOS Transistor Mask Design Using SEM Based E-Beam Lithography at ITEX 2006, 19th - 21st May 2006 at Kuala Lumpur Convention Centre (KLCC), Kuala Lumpur. Electron beam lithography (EBL) is one of the alternative tools in transferring micro and nano circuit patterns from design editor to the substrate. EBL is state-of-the-art technology for micro and even to nano feature size in direct writing technology. SEM based EBL will be used to define the mask for device fabrication. These masks were designed in GDSII Editor in EBL System. Poly-methyl-metacrylate (PMMA) is used as a resist in the EBL. 2010-07-20T04:51:51Z 2010-07-20T04:51:51Z 2006-05-19 Image http://hdl.handle.net/123456789/8345 en 17th International Invention, Innovation & Technology Exhibition 2006 (ITEX 2006) Malaysian Invention & Design Society (MINDS)
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic E-Beam Lithography (EBL)
MOS Transistor Mask Design
KUKUM -- Research
International Invention, Innovation & Technology Exhibition
ITEX 2006
spellingShingle E-Beam Lithography (EBL)
MOS Transistor Mask Design
KUKUM -- Research
International Invention, Innovation & Technology Exhibition
ITEX 2006
Uda, Hashim, Prof. Dr.
Nur Hamidah, Abdul Halim
Mohammad Nuzaihan, Md Nor
Zul Azhar, Zahid Jamal, Prof. Dr.
MOS Transistor Mask Design Using SEM Based E-Beam Lithography
description Prof. Dr. Uda Hashim and his team won silver for MOS Transistor Mask Design Using SEM Based E-Beam Lithography at ITEX 2006, 19th - 21st May 2006 at Kuala Lumpur Convention Centre (KLCC), Kuala Lumpur.
author2 uda@kukum.edu.my
author_facet uda@kukum.edu.my
Uda, Hashim, Prof. Dr.
Nur Hamidah, Abdul Halim
Mohammad Nuzaihan, Md Nor
Zul Azhar, Zahid Jamal, Prof. Dr.
format Image
author Uda, Hashim, Prof. Dr.
Nur Hamidah, Abdul Halim
Mohammad Nuzaihan, Md Nor
Zul Azhar, Zahid Jamal, Prof. Dr.
author_sort Uda, Hashim, Prof. Dr.
title MOS Transistor Mask Design Using SEM Based E-Beam Lithography
title_short MOS Transistor Mask Design Using SEM Based E-Beam Lithography
title_full MOS Transistor Mask Design Using SEM Based E-Beam Lithography
title_fullStr MOS Transistor Mask Design Using SEM Based E-Beam Lithography
title_full_unstemmed MOS Transistor Mask Design Using SEM Based E-Beam Lithography
title_sort mos transistor mask design using sem based e-beam lithography
publisher Malaysian Invention & Design Society (MINDS)
publishDate 2010
url http://dspace.unimap.edu.my/xmlui/handle/123456789/8345
_version_ 1643789159421181952
score 13.214268

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