Effect of substrate bias in copper sputtering plasma measured by Langmuir Probe

• Main Authors: Jia Wei, Low, Nafarizal, Nayan, Mohd Zainizan, Sahdan, Mahamad, Abd Kadir, Mohd Khairul, Ahmad, Ali Yeon, Md Shakaff, Ammar, Zakaria, Fathinul Syahir, Ahmad Saad, Ahmad Faizal, Mohd Zain
• Other Authors: [e-mail]
• Format: Article
• Language: English
• Published: Trans Tech Publications Inc. 2015
• Subjects: Copper oxide; Langmuir probe; Reactive magnetron sputtering
• Online Access: http://dspace.unimap.edu.my:80/xmlui/handle/123456789/39125

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