Description: Simulation for forming Shallow Trench Isolation in the IC using TCAD tools

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Bibliographic Details
Main Author:	Mohd Faiz Mohd Fauzan
Other Authors:	Ruslinda A. Rahim (Advisor)
Format:	Learning Object
Language:	English
Published:	Universiti Malaysia Perlis 2008
Subjects:	Integrated circuits Computer-aided design Silicon Silicon nitride Silicon oxide Metal oxide semiconductors, Complementary Shallow Trench Isolation (STI)
Online Access:	http://dspace.unimap.edu.my/xmlui/handle/123456789/1977
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Summary:	Access is limited to UniMAP community.