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Structural characteristics of samarium oxynitride on silicon substrate

Thermal oxynitridation of 20 nm sputtered pure samarium metal film on silicon substrates were carried out in nitrous oxide gas ambient at various temperatures (600–900 °C) for 15 min. Influences of the oxynitridation temperature on the structural and chemical properties of the SmxOyNz films had been...

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書目詳細資料
Main Authors:	Goh, K.H., Haseeb, A.S. Md. Abdul, Wong, Y.H.
格式:	Article
出版:	Elsevier 2017
主題:	TJ Mechanical engineering and machinery
在線閱讀:	http://eprints.um.edu.my/17554/ https://doi.org/10.1016/j.jallcom.2017.06.179
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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