Characterization of 50 nm MOSFET with dielectric pocket

Characterizat ion of a metal-oxide-semi conductor field effect tran sistor incorporating dielectric pocket (DP) for suppression of short-channel effect (SCE ) is demonstrated by using 2D numerical simulation. An analysis of 120 nm and 50 nm channel length (LJ wit h DP incorp orated between the chann...

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Bibliographic Details
Main Authors: Fauzan, Zul Atfyi, Saad, Ismail, Ismail, Razali
Format: Article
Language:English
Published: Malaysian Institute of Physics 2007
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Online Access:http://eprints.utm.my/id/eprint/8046/2/%5B093-098%5D-zul.pdf
http://eprints.utm.my/id/eprint/8046/
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